300W (3KV) Automatic Matching Network for RF plasma control

300w (3KV) Automatic Matching Network for RF plasma control changes the RF Generated impedance of the plasma chamber to 50 ohms to reach the maximum power from the generator to the chamber. The Vac Techniche  automatic matching networks perform their operation in three independent modes.

The automatic mode continuously compensates the impedance variation of the plasma enclosure.

The manual mode allows the operator to change the matching capacitance values during the process.

In the preset mode, the operator can automatically adjust the capacitance values close to the complete matching condition at the outset so that the matching is performed faster.
The various parameters can be adjusted and have their performance observed via the front panel of the controller system and the VGA connections.

Some of special applications of this device are plasma production for various uses, such as the different stages of deposition (cleaning, etching, sputtering, etc.) as well as the fabrication of microelectronics components in nanotechnology field.